Zirconium target

Zirconium target is a processed product of high-purity zirconium material. Its color is silver-white metallic color, its density is 6.49g/cm3, and its melting point is 1852°C. It has the characteristics of high purity, high density, high-temperature resistance, and corrosion resistance. High-purity zirconium targets can avoid the impact of impurities on film performance; it can improve the adhesion and density of the films; high-temperature resistance and corrosion resistance can ensure stability and stability during the preparation process. life.

characteristics

shape: flat target, rotating target, special-shaped customization

purity: 2N5, 3N5

size: processed according to drawings or customized by others

We can also provide zirconium wire, zirconium flakes, zirconium rods, zirconium granules, zirconium blocks, zirconium powder, etc.

Preparation process

Prepare zirconium material: cut the zirconium rod into small pieces and remove surface oxide;

Prepare the furnace: place the zirconium material in the furnace and add protective gas (usually argon);

Furnace heating: heat the furnace to the melting point of the zirconium material (approximately 1852°C);

Furnace cooling: After the zirconium material is completely melted, lower the furnace temperature to gradually solidify the zirconium material;

Take out the zirconium target material: After the furnace cools down, take out it for subsequent processing and treatment.

It should be noted that the purity of the atmosphere needs to be ensured during the preparation process to avoid contamination of the zirconium material. At the same time, the temperature and melt flow need to be controlled during the preparation process to obtain high-quality zirconium targets. The picture above is the apparent component analysis report of it.

Applications

They are mainly used to prepare thin films of metal oxides, metals, and alloys. These thin films have important applications in the fields of semiconductors, optoelectronics, chemistry, and life sciences. For example, in the semiconductor field, it can be used to prepare gate electrodes and metal interconnect layers in MOSFET devices; in the optoelectronics field, it can be used to prepare cathodes and optical coatings in electron beam evaporators.

In addition to it, we can also provide zirconium-yttrium alloy, zirconium-aluminum alloy, zirconium-copper-titanium alloy, titanium-zirconium alloy, silicon-zirconium alloy, copper-chromium-zirconium alloy, cobalt-zirconium-tantalum alloy, titanium-zirconium-vanadium-aluminum alloy and other sputtering targets material.

If your project happens to require the use of zirconium targets or zirconium alloy targets, please contact us and we will give you a quote and answer your questions within 24 hours!