Zirconium target
Zirconium target characteristics:
Zirconium target shape: flat target, rotating target, special-shaped customization
Zirconium target purity: 2N5, 3N5
Zirconium target size: processed according to drawings or customized by others
Zirconium Target – High-Purity Sputtering Source for Precision Coating
XI AN LINHUI IMPORT AND EXPORT Co., LTD. manufactures enterprise-grade Zirconium target materials engineered for demanding PVD and magnetron sputtering applications. Our targets are available in multiple configurations: flat target, rotating target, and special-shaped customization to fit diverse coating equipment. With controlled purity levels of 2N5 (99.5%) and 3N5 (99.95%), and full dimensional flexibility—processed according to your drawings or custom specifications—our products deliver stable sputtering performance, minimized arcing, and uniform film deposition across optical, decorative, and biomedical coating operations.
Each target undergoes vacuum arc remelting (VAR) and precision thermomechanical treatment to achieve fine grain structures (<100 µm), ensuring consistent erosion rates and reducing target poisoning during reactive processes.
Key Features & Benefits
· Customizable Geometries: Flat, rotary, and special-shaped designs fit various magnetron configurations.
· High Purity Options: 2N5 and 3N5 grades minimize impurity-induced defects in thin films.
· Low Oxygen Content: <500 ppm oxygen reduces dielectric arcing and spitting during deposition.
· Fine Grain Microstructure: Uniform grain size ensures even sputtering and stable plasma distribution.
· Superior Thermal Conductivity: Optional copper-backed bonding available for high-power applications to prevent warping.
Specifications
Parameter | Value |
Shape | Flat target, rotating target, customized |
Purity | 2N5 (99.5%), 3N5 (99.95%) |
Size | Custom processed per drawing |
Density | ≥99% theoretical density (~6.52 g/cm³) |
Grain Size | <100 µm (standard), <40 µm (premium) |
Oxygen Content | <500 ppm |
Melting Point | 1855°C |
Chemical Composition
Typical composition meets ASTM B551 and industry standards for sputtering-grade zirconium:
Element | Content |
Zr + Hf | ≥99.5% / ≥99.95% |
O | <500 ppm |
N | <100 ppm |
C | <200 ppm |
H | <50 ppm |
Fe | <300 ppm |
Manufacturing Process
Our Zirconium target production follows a controlled multi-stage workflow. Raw zirconium sponge is vacuum arc remelted (VAR) to remove interstitials and achieve high density.
The ingot experiences hot fashioning and rolling to refine grain structure. Warm treatment cycles optimize microstructure consistency and minimize inside stress.
Precision CNC machining guarantees dimensional precision per your drawing. Discretionary copper backing holding improves warm conductivity for high-power sputtering frameworks. Last review incorporates ultrasonic testing and surface quality checks some time recently bundling.
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· Density Measurement: Archimedes method confirms ≥99% theoretical density.
· Grain Size Analysis: Metallographic examination ensures uniformity.
· Chemical Analysis: ICP-MS verifies purity and interstitial content.
· Ultrasonic Testing: 100% NDT detects internal voids or inclusions.
· Surface Inspection: Visual and profilometry checks ensure a defect-free finish.
· EN 10204 3.1 / 3.2 Certificates: Full traceability documentation provided.
Applications
Enhancing PVD Coatings: Responsive sputtering with nitrogen produces ZrN movies with gold-like appearance for smartphone outlines, observe cases, and sterile hardware.
Optical & Low-E Glass: High-refractive-index ZrO₂ layers in anti-reflective and Low-Emissivity building glass coatings.
Biomedical Gadgets: Coatings for orthopedic inserts and surgical rebellious use zirconium's biocompatibility and erosion resistance.
Semiconductor & Gadgets: Obstruction layers and door dielectrics in microelectronic creation.
Export Markets
Our products reach over 60 countries, including:
· North America: USA, Canada
· Europe: Germany, France, UK
· Asia-Pacific: Japan, South Korea, Taiwan, Singapore
· Middle East: UAE, Saudi Arabia
· South America: Brazil, Argentina
Why Choose Us?
· Direct Manufacturer: Factory-direct pricing eliminates middlemen costs.
· Fast Turnaround: Stock delivery in 3–7 days; custom orders in 25–40 days.
· Technical Support: In-house metallurgists assist with material selection and process optimization.
· Flexible MOQ: Trial orders welcome; stock orders from 100 kg.
· ISO 9001:2015 Certified: Rigorous quality management system ensures consistency.
· Global Partnerships: Trusted by leading PVD equipment manufacturers and coating service providers.
Packaging & Shipping
Targets are vacuum-sealed in defensive movies to avoid oxidation. Unbending wooden cartons or customized bundling guarantee secure transit.
We back discuss cargo for critical orders and ocean cargo for bulk shipments. Full send out documentation and compliance with REACH/RoHS measures are provided.
FAQ
Q: Can you supply reinforced products?
A: Yes, we offer copper-backed holding to progress warm conductivity for high-power sputtering.
Q: What is the ordinary lead time for custom dimensions?
A: Custom targets require 25–40 days, counting VAR, manufacturing, machining, and inspection.
Q: How do I anticipate arcing amid sputtering?
A: Select targets with <500 ppm oxygen content and ≥99% density to minimize dielectric impurities.
Q: Do you provide material traceability?
A: Yes, each target includes EN 10204 3.1/3.2 certificates with full heat number traceability.
Q: What purity grade should I choose?
A: 2N5 suits standard decorative coatings; 3N5 is recommended for optical and biomedical applications.
Request a Quote
Ready to enhance your coating process with precision-engineered Zirconium target solutions? Contact our team for technical specifications, pricing, and sample availability.
Email: linhui@lhtitanium.com
